Parallel micro manipulator for effective optical spot array alignment

Photolithography is one of the core technologies of micronano fabrication. Recently, lithography technology is applied to diverse field of technologies. These technologies include MEMS (micro electro mechanical system) devices, FPD (flat panel display), and semiconductor industry. When it comes to the typical exposure process of lithography technology, photomask costs is occupying large portion of the optical system. So, how to reduce the cost of the mask and employing maskless lithography technology has become an important issue to engineers. Although there being both advantages and disadvantages, maskless lithography is a receiving substantial attention from engineers in the fileds of micro-nano fabrication. With the development of technology, low cost, flexibility, efficiency in the fabrication of device are in high demand in maskless lithography technology. How to generate line/space patterns is gaining considerable attention in terms of maskless lithography exposure process. In order to achieve the accurate alignments of numerous optical heads within a reasonable amount of tack time, installing autonomous position align micro parallel manipulator system in each optical heads required. Applied parallel manipulator that consists of four 2-DOF (degree of freedom) decoupled actuator gives chances to provide 6-DOF independence motion, and has strength in high accuracy. It is thus, this parallel manipulator is suitable for the experiment. This paper covers the follows: First, we reported the DMD (Digital Micro mirror Device)-based makless lithography system to introduce spot array method in maskless digital exposure process. Second, applying a redundant parallel micro manipulator and analyzing kinematic characteristic of the 4-[PP]PS parallel manipulator is described. After that, comparing benefits and drawbacks of 4-[PP]PS parallel and 4-DOF serial manipulator is covered. Third, proposing a suitable error model of the system and applying the genetic algorithm to alignment spot array concerning position correction. Finally, we designed experiment which has vision sensor and align unit to verify positioning algorithm. Simulation and experimental result will be shown with the regard to parallel manipulator can find the optimal solution based on genetic algorithm and carry out the problem of spot array alignment by reducing the position error of the system.