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Optimizing Post-Metal Annealing Temperature Considering Different Resistive Switching Mechanisms in Ferroelectric Tunnel Junction

  • Ryun Han Koo
  • , Wonjun Shin
  • , Kyung Kyu Min
  • , Dongseok Kwon
  • , Jae Joon Kim
  • , Daewoong Kwon
  • , Jong Ho Lee
  • Seoul National University
  • Hanyang University

Research output: Contribution to journalArticlepeer-review

Abstract

We investigate the effect of post-metal annealing temperature ( ${T}_{\text {PMA}}$ ) on ferroelectric (FE) resistive switching (RS) and non-FE RS in HfOx ferroelectric tunnel junctions. Through conductance analysis and low-frequency noise spectroscopy, the effects of ${T}_{\text {PMA}}$ on RS mechanisms are demonstrated. It is revealed that the non-FE RS, redistribution of oxygen vacancies, is suppressed with an increase in ${T}_{\text {PMA}}$. The effects of different RS mechanisms on the tunneling electroresistance and cycling endurance characteristics are systematically investigated.

Original languageEnglish
Pages (from-to)935-938
Number of pages4
JournalIEEE Electron Device Letters
Volume44
Issue number6
DOIs
StatePublished - 1 Jun 2023
Externally publishedYes

Keywords

  • Ferroelectric tunnel junction (FTJ)
  • low-frequency noise (LFN)
  • post-metal annealing (PMA)

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