Abstract
We investigate the effect of post-metal annealing temperature ( ${T}_{\text {PMA}}$ ) on ferroelectric (FE) resistive switching (RS) and non-FE RS in HfOx ferroelectric tunnel junctions. Through conductance analysis and low-frequency noise spectroscopy, the effects of ${T}_{\text {PMA}}$ on RS mechanisms are demonstrated. It is revealed that the non-FE RS, redistribution of oxygen vacancies, is suppressed with an increase in ${T}_{\text {PMA}}$. The effects of different RS mechanisms on the tunneling electroresistance and cycling endurance characteristics are systematically investigated.
| Original language | English |
|---|---|
| Pages (from-to) | 935-938 |
| Number of pages | 4 |
| Journal | IEEE Electron Device Letters |
| Volume | 44 |
| Issue number | 6 |
| DOIs | |
| State | Published - 1 Jun 2023 |
| Externally published | Yes |
Keywords
- Ferroelectric tunnel junction (FTJ)
- low-frequency noise (LFN)
- post-metal annealing (PMA)
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