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Optical and structural properties of ZnO thin films grown on various substrates by metalorganic chemical vapor deposition

  • Sungkyunkwan University

Research output: Contribution to journalArticlepeer-review

Abstract

We investigated the optical and structural properties of ZnO thin films grown under the same growth condition by metalorganic chemical vapor deposition (MOCVD) on various substrates such as p-Si, n-GaN, c-sapphire, a-sapphire, glass, and ITO glass. The thickness and surface roughness of the ZnO films increased with increasing lattice mismatch between the film and substrate. The ZnO films on c-sapphire showed a higher carrier concentration and conductivity than the ZnO thin films on a-sapphire and glass. In addition, the intensity of the near band-edge emission and transmittance increased with decreasing lattice mismatch between the film and substrate.

Original languageEnglish
Pages (from-to)399-403
Number of pages5
JournalPhysica B: Condensed Matter
Volume401-402
DOIs
StatePublished - 15 Dec 2007

Keywords

  • MOCVD
  • Various substrates
  • ZnO thin films

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