Abstract
We observed the formation of oxide precipitates (bcc- In2 O3) in InN nanostructures formed during metal-organic chemical vapor deposition (MOCVD) and/or subsequent postgrowth procedures in H2 ambient. It was found that InN is extremely unstable in H2 ambient and the activation energy of N2 desorption of InN is measured to be ∼0.28 eV, which is one order of magnitude smaller than that of reported value of InN in vacuum. Instability of InN nanostructures under H2 ambient together with residual oxidant in the reactor facilitates the formation of indium oxide precipitates in the nanostructure matrix during MOCVD or the oxidation of residual indium at the surface, resulting in indium oxide dots.
| Original language | English |
|---|---|
| Article number | 234102 |
| Journal | Applied Physics Letters |
| Volume | 91 |
| Issue number | 23 |
| DOIs | |
| State | Published - 2007 |