Nanostructures fabrication on Ta thin film using atomic force microscope lithography

Research output: Contribution to journalArticlepeer-review

Abstract

Atomic force microscope (AFM) lithography based on localized current injection was carried out for fabricating nanostructures of metal oxide on tantalum (Ta). Fabricated nanopatterns of tantalum oxide (Ta 2 O 5 ) were selectively etched by magnetically enhanced inductively coupled plasma (MEICP) etching system. Nanopatterns of Ta with feature size in the range of a few tens-hundreds nm were successfully fabricated.

Original languageEnglish
Pages (from-to)115/[405]-118/[408]
JournalMolecular Crystals and Liquid Crystals
Volume445
DOIs
StatePublished - 2006

Keywords

  • Atomic force microscope (AFM) lithography
  • Etching
  • Nanopattern
  • Ta

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