Abstract
Atomic force microscope (AFM) lithography based on localized current injection was carried out for fabricating nanostructures of metal oxide on tantalum (Ta). Fabricated nanopatterns of tantalum oxide (Ta 2 O 5 ) were selectively etched by magnetically enhanced inductively coupled plasma (MEICP) etching system. Nanopatterns of Ta with feature size in the range of a few tens-hundreds nm were successfully fabricated.
| Original language | English |
|---|---|
| Pages (from-to) | 115/[405]-118/[408] |
| Journal | Molecular Crystals and Liquid Crystals |
| Volume | 445 |
| DOIs | |
| State | Published - 2006 |
Keywords
- Atomic force microscope (AFM) lithography
- Etching
- Nanopattern
- Ta