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Nanoelectromechanical switch with low voltage drive

  • J. E. Jang
  • , S. N. Cha
  • , Y. Choi
  • , T. P. Butler
  • , D. J. Kang
  • , D. G. Hasko
  • , J. E. Jung
  • , Y. W. Jin
  • , J. M. Kim
  • , G. A.J. Amaratunga
  • Samsung
  • University of Cambridge
  • Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

Abstract

The triode structure vertical carbon nanotube based nanoelectromechanical switch shows excellent low voltage drive (∼4.5 V), owing to its vertical gate and the narrow gap between structural elements. The insulator deposition and the selective etching process steps simplify fabrication through self-alignment. The thickness of the insulator determines the width of the gap and the etching process, used to produce the vertical gate, removes the need for a complicated lithography step. The low drive voltage increases device stability and reliability and allows the device to be deployed in a wide range of applications.

Original languageEnglish
Article number113105
JournalApplied Physics Letters
Volume93
Issue number11
DOIs
StatePublished - 2008
Externally publishedYes

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