Moisture permeation through ultrathin Tio 2 films grown by atomic layer deposition

Seung Woo Seo; Eun Jung; Chankyu Lim; Heeyeop Chae; Sung Min Cho

doi:10.1143/APEX.5.035701

Moisture permeation through ultrathin Tio ₂ films grown by atomic layer deposition

Seung Woo Seo
, Eun Jung
, Chankyu Lim
, Heeyeop Chae
, Sung Min Cho

Department of Chemical Engineering

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

45 Scopus citations

Abstract

We report on moisture permeation through ultrathin TiO2 barrier layers grown by atomic layer deposition (ALD). The steady-state water vapor transmission rate (WVTR) was as low as 6 × 10 ^-4 g/(m ².day) as determined by electrical Ca test at 60°C and 85% relative humidity (RH). These Ca test measurement results confirmed the existence of a critical thickness at which the WVTR changes abruptly. In addition, the results revealed that the moisture permeation through the layer occurred via two distinctly different mechanisms. The time to failure of the barrier film, rather than the steady-state WVTR, was proposed in order to evaluate the barrier property more accurately.

Original language	English
Article number	035701
Journal	Applied Physics Express
Volume	5
Issue number	3
DOIs	https://doi.org/10.1143/APEX.5.035701
State	Published - Mar 2012

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title = "Moisture permeation through ultrathin Tio 2 films grown by atomic layer deposition",

abstract = "We report on moisture permeation through ultrathin TiO2 barrier layers grown by atomic layer deposition (ALD). The steady-state water vapor transmission rate (WVTR) was as low as 6 × 10 -4 g/(m 2.day) as determined by electrical Ca test at 60°C and 85\% relative humidity (RH). These Ca test measurement results confirmed the existence of a critical thickness at which the WVTR changes abruptly. In addition, the results revealed that the moisture permeation through the layer occurred via two distinctly different mechanisms. The time to failure of the barrier film, rather than the steady-state WVTR, was proposed in order to evaluate the barrier property more accurately.",

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AU - Seo, Seung Woo

AU - Jung, Eun

AU - Lim, Chankyu

AU - Chae, Heeyeop

AU - Cho, Sung Min

PY - 2012/3

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AB - We report on moisture permeation through ultrathin TiO2 barrier layers grown by atomic layer deposition (ALD). The steady-state water vapor transmission rate (WVTR) was as low as 6 × 10 -4 g/(m 2.day) as determined by electrical Ca test at 60°C and 85% relative humidity (RH). These Ca test measurement results confirmed the existence of a critical thickness at which the WVTR changes abruptly. In addition, the results revealed that the moisture permeation through the layer occurred via two distinctly different mechanisms. The time to failure of the barrier film, rather than the steady-state WVTR, was proposed in order to evaluate the barrier property more accurately.

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Moisture permeation through ultrathin Tio ₂ films grown by atomic layer deposition

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