@inproceedings{aad4ef19cbdf4102a19bc3f89af183b6,
title = "Low temperature silicon nitride thin films for moisture barrier layers by a PECVD process",
abstract = "Low temperature silicon nitride thin films were deposited by a plasma enhanced chemical vapor deposition (PECVD) process for moisture barrier layers. Inorganic thin films was fabricated in various process conditions. In this research, Water vapor transmission rate (WVTR) of below 10-2g/m2-day was achieved.",
keywords = "Chemical vapor deposition (CVD), Encapsulation, Plasma enhanced CVD, Silicon nitride",
author = "Kim, \{Sun Jung\} and Yong, \{Sang Heon\} and Ann, \{Hyung June\} and Satoko Gatineau and Heeyeop Chae",
note = "Publisher Copyright: {\textcopyright} 2015 Proceedings of the International Display Workshops. All rights reserved.; 22nd International Display Workshops, IDW 2015 ; Conference date: 09-12-2015 Through 11-12-2015",
year = "2015",
language = "English",
series = "Proceedings of the International Display Workshops",
publisher = "International Display Workshops",
pages = "1760--1761",
booktitle = "22nd International Display Workshops, IDW 2015",
address = "Japan",
}