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Low temperature fabrication and physical properties of 5 at.% Ga-doped ZnO films for transparent electrode applications

  • Young Hun Kang
  • , Choon Gi Choi
  • , Sung Yool Choi
  • , Eunkyoung Nam
  • , Donggeun Jung
  • , Jin Hyo Boo
  • , Jeong Won Kim
  • , Ji Hong Jung
  • , Jae Sang Cha
  • , Young Sung Kim
  • LG Corporation
  • Electronics and Telecommunications Research Institute
  • Sungkyunkwan University
  • Korea Research Institute of Standards and Science
  • Daejeon University
  • Seoul National University of Science and Technology (SNUST)

Research output: Contribution to journalArticlepeer-review

Abstract

Transparent conductive 5 at.% Ga-doped ZnO (GZO) thin films are deposited on a glass substrate by an asymmetrical bipolar-pulsed DC magnetron sputtering at various substrate temperatures. All the GZO films have nanocrystalline structure and compact surface morphology. A highly c-axis oriented GZO film was grown perpendicular to the substrate at the 200C. The measured work function of GZO film deposited at 200°C shows slightly lower value of 4.37 eV than a commercial ITO film of 4.6 eV. The GZO film showed the lowest sheet resistance of 35 Ω/□, a carrier concentration of 1.2 ×1021 cm-3, a mobility of 9.9 cm2/Vs, and high optical transmittance of over 85% in the visible range. It indicates that the GZO films at 200°C can be promising as an alternative to ITO thin film for transparent electrode applications.

Original languageEnglish
Pages (from-to)101-105
Number of pages5
JournalFunctional Materials Letters
Volume3
Issue number2
DOIs
StatePublished - Jun 2010

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Keywords

  • Ga-doped ZnO (GZO)
  • optical property
  • sputtering
  • transparent conductive oxide

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