Linear inductive antenna design for large area flat panel display plasma processing

K. N. Kim; J. H. Lim; H. B. Jeong; G. Y. Yeom; S. H. Lee; J. K. Lee

doi:10.1016/j.mee.2011.07.003

Linear inductive antenna design for large area flat panel display plasma processing

K. N. Kim, J. H. Lim, H. B. Jeong, G. Y. Yeom, S. H. Lee, J. K. Lee

Department of Advanced Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Two different internal-type linear inductive antenna arrangements, that is, parallel and anti-parallel antenna arrangements having different current directions between adjacent antennas were investigated for a large area plasma source having the size of 1020 mm × 830 mm. The electric field profile and plasma density of Ar calculated by the F2L code showed consistent results with the experimental results on the plasma density and processing results. The results showed that the anti-parallel antenna arrangement showed better plasma uniformity compared to the parallel antenna arrangement due to the destructive E_z-field between adjacent antennas even though the destructive E _z-field decreases the plasma density at the center of the chamber.

Original language	English
Pages (from-to)	133-137
Number of pages	5
Journal	Microelectronic Engineering
Volume	89
Issue number	1
DOIs	https://doi.org/10.1016/j.mee.2011.07.003
State	Published - Jan 2012

Keywords

Etching
Plasma
Uniformity

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10.1016/j.mee.2011.07.003

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title = "Linear inductive antenna design for large area flat panel display plasma processing",

abstract = "Two different internal-type linear inductive antenna arrangements, that is, parallel and anti-parallel antenna arrangements having different current directions between adjacent antennas were investigated for a large area plasma source having the size of 1020 mm × 830 mm. The electric field profile and plasma density of Ar calculated by the F2L code showed consistent results with the experimental results on the plasma density and processing results. The results showed that the anti-parallel antenna arrangement showed better plasma uniformity compared to the parallel antenna arrangement due to the destructive Ez-field between adjacent antennas even though the destructive E z-field decreases the plasma density at the center of the chamber.",

keywords = "Etching, Plasma, Uniformity",

author = "Kim, \{K. N.\} and Lim, \{J. H.\} and Jeong, \{H. B.\} and Yeom, \{G. Y.\} and Lee, \{S. H.\} and Lee, \{J. K.\}",

year = "2012",

month = jan,

doi = "10.1016/j.mee.2011.07.003",

language = "English",

volume = "89",

pages = "133--137",

journal = "Microelectronic Engineering",

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T1 - Linear inductive antenna design for large area flat panel display plasma processing

AU - Kim, K. N.

AU - Lim, J. H.

AU - Jeong, H. B.

AU - Yeom, G. Y.

AU - Lee, S. H.

AU - Lee, J. K.

PY - 2012/1

Y1 - 2012/1

N2 - Two different internal-type linear inductive antenna arrangements, that is, parallel and anti-parallel antenna arrangements having different current directions between adjacent antennas were investigated for a large area plasma source having the size of 1020 mm × 830 mm. The electric field profile and plasma density of Ar calculated by the F2L code showed consistent results with the experimental results on the plasma density and processing results. The results showed that the anti-parallel antenna arrangement showed better plasma uniformity compared to the parallel antenna arrangement due to the destructive Ez-field between adjacent antennas even though the destructive E z-field decreases the plasma density at the center of the chamber.

AB - Two different internal-type linear inductive antenna arrangements, that is, parallel and anti-parallel antenna arrangements having different current directions between adjacent antennas were investigated for a large area plasma source having the size of 1020 mm × 830 mm. The electric field profile and plasma density of Ar calculated by the F2L code showed consistent results with the experimental results on the plasma density and processing results. The results showed that the anti-parallel antenna arrangement showed better plasma uniformity compared to the parallel antenna arrangement due to the destructive Ez-field between adjacent antennas even though the destructive E z-field decreases the plasma density at the center of the chamber.

KW - Etching

KW - Plasma

KW - Uniformity

UR - https://www.scopus.com/pages/publications/81855185295

U2 - 10.1016/j.mee.2011.07.003

DO - 10.1016/j.mee.2011.07.003

M3 - Article

AN - SCOPUS:81855185295

SN - 0167-9317

VL - 89

SP - 133

EP - 137

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1

ER -

Linear inductive antenna design for large area flat panel display plasma processing

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Keywords

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