Learning Style Correlation for Elaborate Few-Shot Classification

Junho Kim, Minsu Kim, Jung Uk Kim, Hong Joo Lee, Sangmin Lee, Joanna Hong, Yong Man Ro

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Few-shot classification is defined as a task where the network aims to classify unseen classes given only a few samples. Recent approaches, especially metric-based methods, have great progress in few-shot classification. However, the existing metric-based methods have a limitation in deploying discriminative features for elaborate comparison. They usually extract features from the embedding network without direct consideration of the relationship between support and query sets. To address the relationship, we propose a novel architecture, Style Correlated Module (SCM) to learn style correlation between support and query sets for few-shot classification. The proposed module leads support and query feature maps to focus on significant style correlated features and encourage the metric network to conduct an elaborate comparison. Furthermore, the proposed module can be generally applied to the existing metric-based approaches by adding the SCM behind the embedding network. We evaluate our proposed method with comprehensive experiments on two publicly available datasets and demonstrate its effectiveness with comparable results.

Original languageEnglish
Title of host publication2020 IEEE International Conference on Image Processing, ICIP 2020 - Proceedings
PublisherIEEE Computer Society
Pages1791-1795
Number of pages5
ISBN (Electronic)9781728163956
DOIs
StatePublished - Oct 2020
Externally publishedYes
Event2020 IEEE International Conference on Image Processing, ICIP 2020 - Virtual, Abu Dhabi, United Arab Emirates
Duration: 25 Sep 202028 Sep 2020

Publication series

NameProceedings - International Conference on Image Processing, ICIP
Volume2020-October
ISSN (Print)1522-4880

Conference

Conference2020 IEEE International Conference on Image Processing, ICIP 2020
Country/TerritoryUnited Arab Emirates
CityVirtual, Abu Dhabi
Period25/09/2028/09/20

Keywords

  • Deep learning
  • Few-shot classification
  • Style Correlated Module
  • Style correlation

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