@inproceedings{95d7e616234a449ebdc845751a896d5f,
title = "Lattice Boltzmann simulation of cavitation and particle behavior induced by sonication transducer",
abstract = "In the semiconductor process, cleaning wafer surface by megasonic transducer with thin liquid film is getting more attention than conventional bath-type batch cleaner. Although its major contribution to the cleaning process, nanoparticle removal mechanism of megasonic cleaning is not fully understood yet. Thus the understanding of the cavitation bubble motion formed by megasonic wave is very important. Due to rapid motion of the bubbles experimental observation of their movement is hard to achieve. In present study, we introduce lattice Boltzmann method to simulation fluid and cavitation bubble behavior. Validation was achieved by compare the simulation result with analytical solution of fluid motion. It was shown that bubbles formed by cavitation phenomena can be expanded, shrunken, or even collapsed to emit shockwave.",
author = "Hojoong Kim and Taesung Kim",
year = "2011",
doi = "10.1149/1.3630833",
language = "English",
isbn = "9781566779050",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "5",
pages = "109--113",
booktitle = "Semiconductor Cleaning Science and Technology 12, SCST 12",
edition = "5",
note = "12th International Symposium on Semiconductor Cleaning Science and Technology, SCST12 - 220th ECS Meeting ; Conference date: 10-10-2011 Through 11-10-2011",
}