Abstract
In this study, the characteristics of large area internal linear ICP sources of 1,020mm×920mm (substrate area is 880mm×660mm) were investigated using a multiple linear antennas with U-type parallel connection. Using the multiple linear antennas with U-type parallel connection, a high plasma density of 2 ×1011/cm3 and a high power transfer efficiency of about 88% could be obtained at 5kW of RF power and with 20mTorr Ar. A low plasma potential of less than 26V and a low electron temperature of 2.6-3.2eV could be also obtained. The measured plasma uniformity on the substrate size of 4th generation (880mm×660mm) was about 4%, therefore, it is believed that the multiple linear antennas with U-type parallel connection can be successfully applicable to the large area flat panel display processing.
| Original language | English |
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| Pages (from-to) | 544-547 |
| Number of pages | 4 |
| Journal | Proceedings of International Meeting on Information Display |
| Volume | 2006 |
| State | Published - 2006 |
| Event | IMID/IDMC 2006: 6th Internaional Meeting on Information Display and the 5th International Display Manufacturing Conference - Daegu, Korea, Republic of Duration: 22 Aug 2006 → 25 Aug 2006 |