Large area mono-crystalline silicon solar cell using SOD

U. Gangopadhyay, S. Park, K. Kim, J. Park, D. Kim, J. Yi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

The process parameters for the fabrication of large area mono-crystalline silicon solar cells using Spin-on doping (SOD) and IR lamp furnace annealing have been investigated. The removal of the spin-on glass residuals formed during IR lamp furnace annealing which generate recombination centres, high resistances, and increased leakage current thereby lowering the solar cell efficiency is key issue of this paper. We have applied a novel chemical treatment to remove the organic residual using hot HCl treatment. This novel chemical treatment improves greatly the solar cell leakage current leading to increased shunt resistance and also the efficiency of the mono-crystalline solar cells. This paper reports on the successful fabrication of 13.1% efficiency large area (103mm×103mm) mono-crystalline silicon solar cells with PECVD silicon nitride antireflection coating.

Original languageEnglish
Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
Pages1431-1434
Number of pages4
StatePublished - 2003
EventProceddings of the 3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
Duration: 11 May 200318 May 2003

Publication series

NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
VolumeB

Conference

ConferenceProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
Country/TerritoryJapan
CityOsaka
Period11/05/0318/05/03

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