L10 ordering of FePtB layers by oxidation-induced stress of capping layer

Gyung Min Choi; Byoung Chul Min; Kyung Ho Shin

doi:10.1007/s00339-012-7512-3

L1₀ ordering of FePtB layers by oxidation-induced stress of capping layer

Gyung Min Choi, Byoung Chul Min, Kyung Ho Shin

Korea Institute of Science and Technology

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

We have studied the L1₀ ordering of FePtB layers assisted by the oxidation-induced stress of a capping layer. In the thermally oxidized Si substrate/MgO/CoFeB/FePtB/Ti structure, the oxidation of the Ti capping layer during post-deposition annealing exerts an in-plane tensile stress on the FePtB layer, which promotes L1₀ ordering of the FePtB layer. The diffusion of boron from the FePtB layer into the Ti layer also plays a crucial role in the L1₀ ordering. The CoFeB/FePtB composite layers can be used for the top electrode of perpendicular magnetic tunnel junctions.

Original language	English
Pages (from-to)	389-394
Number of pages	6
Journal	Applied Physics A: Materials Science and Processing
Volume	111
Issue number	2
DOIs	https://doi.org/10.1007/s00339-012-7512-3
State	Published - May 2013
Externally published	Yes

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@article{77c4960d35d847298bfa710b62362d1d,

title = "L10 ordering of FePtB layers by oxidation-induced stress of capping layer",

abstract = "We have studied the L10 ordering of FePtB layers assisted by the oxidation-induced stress of a capping layer. In the thermally oxidized Si substrate/MgO/CoFeB/FePtB/Ti structure, the oxidation of the Ti capping layer during post-deposition annealing exerts an in-plane tensile stress on the FePtB layer, which promotes L10 ordering of the FePtB layer. The diffusion of boron from the FePtB layer into the Ti layer also plays a crucial role in the L10 ordering. The CoFeB/FePtB composite layers can be used for the top electrode of perpendicular magnetic tunnel junctions.",

author = "Choi, \{Gyung Min\} and Min, \{Byoung Chul\} and Shin, \{Kyung Ho\}",

year = "2013",

month = may,

doi = "10.1007/s00339-012-7512-3",

language = "English",

volume = "111",

pages = "389--394",

journal = "Applied Physics A: Materials Science and Processing",

issn = "0947-8396",

publisher = "Springer Heidelberg",

number = "2",

}

TY - JOUR

T1 - L10 ordering of FePtB layers by oxidation-induced stress of capping layer

AU - Choi, Gyung Min

AU - Min, Byoung Chul

AU - Shin, Kyung Ho

PY - 2013/5

Y1 - 2013/5

N2 - We have studied the L10 ordering of FePtB layers assisted by the oxidation-induced stress of a capping layer. In the thermally oxidized Si substrate/MgO/CoFeB/FePtB/Ti structure, the oxidation of the Ti capping layer during post-deposition annealing exerts an in-plane tensile stress on the FePtB layer, which promotes L10 ordering of the FePtB layer. The diffusion of boron from the FePtB layer into the Ti layer also plays a crucial role in the L10 ordering. The CoFeB/FePtB composite layers can be used for the top electrode of perpendicular magnetic tunnel junctions.

AB - We have studied the L10 ordering of FePtB layers assisted by the oxidation-induced stress of a capping layer. In the thermally oxidized Si substrate/MgO/CoFeB/FePtB/Ti structure, the oxidation of the Ti capping layer during post-deposition annealing exerts an in-plane tensile stress on the FePtB layer, which promotes L10 ordering of the FePtB layer. The diffusion of boron from the FePtB layer into the Ti layer also plays a crucial role in the L10 ordering. The CoFeB/FePtB composite layers can be used for the top electrode of perpendicular magnetic tunnel junctions.

UR - https://www.scopus.com/pages/publications/84878125918

U2 - 10.1007/s00339-012-7512-3

DO - 10.1007/s00339-012-7512-3

M3 - Article

AN - SCOPUS:84878125918

SN - 0947-8396

VL - 111

SP - 389

EP - 394

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

IS - 2

ER -

L1₀ ordering of FePtB layers by oxidation-induced stress of capping layer

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