Kinematic design of a redundant parallel mechanism for maskless lithography optical instrument manipulations

A new precision parallel mechanism having actuation redundancy will be introduced in this paper. Physical contribution of the actuation redundancy for the precision parallel mechanism is reviewed. In addition, several kinematic configurations have been analyzed for degrees of freedom verification and actuation redundancy. A new kinematic configuration which is 4-[P P]PS is suggested. The suggested 4-[P P]PS mechanism which has actuation redundancy provides six degrees of freedom to the mobile platform. For position control and path planning of the mobile platform, the inverse and the forward kinematics are solved for closed-form solutions. In order to verify the inverse and the forward kinematics, a numerical simulation result is presented. In addition to the inverse and forward accuracy proof, the numerical analysis provides other information such as independent translation motion, calibrated rotation arm at tilting motion, and symmetric motion at rotating motion.