Skip to main navigation Skip to search Skip to main content

Interface formation and electrical properties of a TiNx/SiO2/Si structure for application in gate electrodes

  • K. S. Kim
  • , Y. C. Jang
  • , K. J. Kim
  • , N. E. Lee
  • , S. P. Youn
  • , K. J. Roh
  • , Y. H. Roh
  • Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

8   Link opens in a new tab Scopus citations

Fingerprint

Dive into the research topics of 'Interface formation and electrical properties of a TiNx/SiO2/Si structure for application in gate electrodes'. Together they form a unique fingerprint.
Sort by

Engineering

Material Science