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Inductively coupled plasma reactive ion etching of ZrO2:H solid electrolyte film in BCl3-based plasmas

  • Han Ki Kim
  • , J. W. Bae
  • , I. Adesida
  • , T. Kim
  • , Tae Yeon Seong
  • , Joo Sun Kim
  • , Y. S. Yoon
  • Samsung
  • University of Illinois at Urbana-Champaign
  • Gwangju Institute of Science and Technology
  • Korea Institute of Science and Technology
  • Konkuk University

Research output: Contribution to journal › Article › peer-review

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