TY - GEN
T1 - Improving BSIM Flicker Noise Model
AU - Seo, Youngsoo
AU - Woo, Changbeom
AU - Lee, Myunghee
AU - Kang, Myounggon
AU - Jeon, Jongwook
AU - Shin, Hyungcheol
N1 - Publisher Copyright:
© 2019 IEEE.
PY - 2019/3
Y1 - 2019/3
N2 - We modified BSIM flicker noise model and extracted the noise parameters as a function of gate bias. In the proposed model, three noise parameters (NOIA, NOIB and NOIC) were found to be proportional to the oxide trap density. The measured flicker noise of the MOSFET is compared with the existing model and the proposed model, and it is confirmed that the proposed model has higher accuracy.
AB - We modified BSIM flicker noise model and extracted the noise parameters as a function of gate bias. In the proposed model, three noise parameters (NOIA, NOIB and NOIC) were found to be proportional to the oxide trap density. The measured flicker noise of the MOSFET is compared with the existing model and the proposed model, and it is confirmed that the proposed model has higher accuracy.
KW - Carrier number fluctuation
KW - Mobility fluctuation
KW - NOIB
KW - NOIC
KW - Noise parameter NOIA
KW - Oxide trap density
KW - Unified flicker noise model
UR - https://www.scopus.com/pages/publications/85067801075
U2 - 10.1109/EDTM.2019.8731123
DO - 10.1109/EDTM.2019.8731123
M3 - Conference contribution
AN - SCOPUS:85067801075
T3 - 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
SP - 32
EP - 34
BT - 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
Y2 - 12 March 2019 through 15 March 2019
ER -