Abstract
We improve the PBTS instability of top-gate coplanar amorphous In Ga ZnO TFTs by optimizing the buffer and gate insulator layers. The interface trap density is obtained from photonic capacitance-voltage measurements and correlated with PBTS characteristics. Inter-diffusion at the gate insulator interface lessens electron trap defects, which brings improvement in PBTS from δh = 4.2 V to 0.5 V.
| Original language | English |
|---|---|
| Pages (from-to) | 1143-1146 |
| Number of pages | 4 |
| Journal | Digest of Technical Papers - SID International Symposium |
| Volume | 46 |
| Issue number | Book 3 |
| DOIs | |
| State | Published - 1 Jun 2015 |
| Externally published | Yes |
| Event | 2015 SID International Symposium - San Jose, United States Duration: 4 Jun 2015 → 5 Jun 2015 |
Keywords
- A-IGZO
- Coplanar
- Interface trap density (Dit)
- Oxide TFT
- PBTS
- Photo C-V method