Improvement of a block co-polymer (PS-b-PMMA)-masked silicon etch profile using a neutral beam

  • Deokhyun Yun
  • , Jinwoo Park
  • , Hwasung Kim
  • , Jeongho Mun
  • , Sangouk Kim
  • , Kyongnam Kim
  • , Geunyoung Yeom

Research output: Contribution to journal › Article › peer-review

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