Abstract
Si/SiO2/Ta/NiFe/Mn-Ir/CoFe/NOL/CoFe/Al-O/CoFe/NiFe/Ta bottom conventional (without nano-oxide layer, NOL) and specular (with NOL) MTJs were prepared by DC magnetron sputtering methods. In the case of a conventional MTJ, the TMR ratio increased up to 300°C but the TMR ratio of a specular MTJ increased up to 400°C. The highest TMR ratios of two samples after annealing at each optimal temperature were 21.6% (conventional MTJ) and 22.7% (specular MTJ), respectively, This improved thermal property of the specular MTJ is due to the NOL, which could act as a diffusion barrier for Mn. The bias-voltage dependence of both samples was vastly improved after annealing at each optimal temperature.
| Original language | English |
|---|---|
| Pages (from-to) | 1716-1719 |
| Number of pages | 4 |
| Journal | Physica Status Solidi (A) Applied Research |
| Volume | 201 |
| Issue number | 8 |
| DOIs | |
| State | Published - Jun 2004 |
Fingerprint
Dive into the research topics of 'Improved thermal stability of Mn-Ir-based magnetic tunnel junction with nano-oxide layer'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver