Improved Reliability of a-IGZO Thin Film Transistor through Organic/Inorganic Passivation Layer

  • Tae Eun Ha
  • , Jeong Hyun Ahn
  • , Eun Kyung Jo
  • , Eun Kyo Jung
  • , Hwarim Im
  • , Yong Sang Kim

Research output: Contribution to journalConference articlepeer-review

Abstract

The electrical characteristics and reliability of an amorphous indium gallium zinc oxide thin film transistor (a-IGZO TFT) was improved two materials, organic and inorganic, as a passivation layer in a stacked structure. it can reduce defect state and acts as an excellent barrier against adsorption/desorption of atmospheric molecules.

Original languageEnglish
Pages (from-to)202-205
Number of pages4
JournalProceedings of the International Display Workshops
Volume29
StatePublished - 2022
Externally publishedYes
Event29th International Display Workshops, IDW 2022 - Fukuoka, Japan
Duration: 14 Dec 202216 Dec 2022

Keywords

  • Hybrid passivation
  • IGZO
  • Oxide thin film transistor
  • Sol-gel

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