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Imprint failures and asymmetric electrical properties induced by thermal processes in epitaxial Bi4Ti3O12 thin films

  • B. H. Park
  • , S. J. Hyun
  • , C. R. Moon
  • , Byung Doo Choe
  • , J. Lee
  • , C. Y. Kim
  • , W. Jo
  • , T. W. Noh
  • Seoul National University
  • LG Corporation

Research output: Contribution to journalArticlepeer-review

Abstract

Epitaxial Bi4Ti3O12 (BTO) thin films were deposited on MgO(001) substrates using Pt layers as top and bottom electrodes. In spite of the apparently symmetric capacitor structure, polarization-voltage measurements revealed strong imprint failures and current-voltage measurements showed rectifying behaviors. Imprint pulse tests with a 5 V dc bias and post-annealing treatments suggested that the asymmetric behaviors should be due to interfacial states induced by thermal processes. To probe the interfacial states, capacitance-voltage (C-V) measurements were performed. By fitting the C-V data with a model which describes the Pt/BTO/Pt structure as a series circuit composed of three capacitors, built-in voltages at the top and the bottom interfaces could be determined. Difference in the built-in voltages could explain the imprint failures and the rectifying behaviors. The interfacial states in the BTO capacitors were controlled by varying electrode materials.

Original languageEnglish
Pages (from-to)4428-4435
Number of pages8
JournalJournal of Applied Physics
Volume84
Issue number8
DOIs
StatePublished - 15 Oct 1998

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