Hydrogenated amorphous silicon germanium active layer for top cell of a multi junction cell structure

  • Jaehyun Cho
  • , S. M. Iftiquar
  • , Minbum Kim
  • , Jinjoo Park
  • , Junhee Jung
  • , Jiwoong Kim
  • , Junsin Yi

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Intrinsic hydrogenated amorphous silicon-germanium (a-SiGe:H) alloy is generally used in the bottom cell because of its low band gap. The a-SiGe:H has a higher photo conductivity in comparison to the a-Si:H; thus, it is expected that the a-SiGe:H can show better short circuit current density than that of the a-Si:H based solar cell. Therefore, we optimized a-SiGe:H active layer that can be a suitable choice for the front cell of a multi junction solar cell. Furthermore, we carried out a comparative study of the solar cells that have a-SiGe:H and a-Si:H as respective active layers. The a-SiGe:H based solar cells show higher short circuit current density, while the a-Si:H based cells show higher open circuit voltage. The current-voltage characteristics of these cells are as follows: (a) Voc = 770 mV, Jsc = 15.0 mA/cm2, FF = 64.5%, and η = 7.47% for a-SiGe:H based cell; and (b) Voc = 826 mV, Jsc = 13.63 mA/cm2, FF = 72.0%, and η = 8.1% for a-Si:H based cell.

Original languageEnglish
Pages (from-to)4870-4874
Number of pages5
JournalJournal of Nanoscience and Nanotechnology
Volume16
Issue number5
DOIs
StatePublished - May 2016

Keywords

  • a-SiGe:H
  • Amorphous silicon solar cell
  • Current density
  • External quantum efficiency
  • Low band gap

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