Homogeneous Al2O3 multilayer structures with reinforced mechanical stability for high-performance and high-throughput thin-film encapsulation

Yun Hyuk Choi; Young Gu Lee; Xavier Bulliard; Kwang Hee Lee; Sangyoon Lee; Dukhyun Choi; Jong Jin Park; Jong Min Kim

doi:10.1016/j.scriptamat.2009.12.006

Homogeneous Al₂O₃ multilayer structures with reinforced mechanical stability for high-performance and high-throughput thin-film encapsulation

Yun Hyuk Choi
, Young Gu Lee
, Xavier Bulliard
, Kwang Hee Lee
, Sangyoon Lee
, Dukhyun Choi
, Jong Jin Park
, Jong Min Kim

Samsung

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

Homogeneous multilayered barrier films were fabricated by means of reactive and nonreactive sputtering of Al₂O₃. Homogeneous multilayer structures were seen to possess superior mechanical stability than single-layered films. The multilayer films presented 50% improved barrier performance and the fabrication process was 40% faster compared with single Al₂O₃ layers of the same thickness. The water vapor transmission rate was enhanced up to the order of 10^-4 g m^-2 day^-1 from a three-pair system of reactive and nonreactive sputtered Al₂O₃ bilayers.

Original language	English
Pages (from-to)	447-450
Number of pages	4
Journal	Scripta Materialia
Volume	62
Issue number	7
DOIs	https://doi.org/10.1016/j.scriptamat.2009.12.006
State	Published - Apr 2010
Externally published	Yes

Keywords

Amorphous oxides
Gas barrier
Internal stresses
Multilayer thin films
Sputtering

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10.1016/j.scriptamat.2009.12.006

Cite this

@article{714714d5d25a49f38780ee2aa2701e8b,

title = "Homogeneous Al2O3 multilayer structures with reinforced mechanical stability for high-performance and high-throughput thin-film encapsulation",

abstract = "Homogeneous multilayered barrier films were fabricated by means of reactive and nonreactive sputtering of Al2O3. Homogeneous multilayer structures were seen to possess superior mechanical stability than single-layered films. The multilayer films presented 50\% improved barrier performance and the fabrication process was 40\% faster compared with single Al2O3 layers of the same thickness. The water vapor transmission rate was enhanced up to the order of 10-4 g m-2 day-1 from a three-pair system of reactive and nonreactive sputtered Al2O3 bilayers.",

keywords = "Amorphous oxides, Gas barrier, Internal stresses, Multilayer thin films, Sputtering",

author = "Choi, \{Yun Hyuk\} and Lee, \{Young Gu\} and Xavier Bulliard and Lee, \{Kwang Hee\} and Sangyoon Lee and Dukhyun Choi and Park, \{Jong Jin\} and Kim, \{Jong Min\}",

year = "2010",

month = apr,

doi = "10.1016/j.scriptamat.2009.12.006",

language = "English",

volume = "62",

pages = "447--450",

journal = "Scripta Materialia",

issn = "1359-6462",

publisher = "Acta Materialia Inc",

number = "7",

}

TY - JOUR

T1 - Homogeneous Al2O3 multilayer structures with reinforced mechanical stability for high-performance and high-throughput thin-film encapsulation

AU - Choi, Yun Hyuk

AU - Lee, Young Gu

AU - Bulliard, Xavier

AU - Lee, Kwang Hee

AU - Lee, Sangyoon

AU - Choi, Dukhyun

AU - Park, Jong Jin

AU - Kim, Jong Min

PY - 2010/4

Y1 - 2010/4

N2 - Homogeneous multilayered barrier films were fabricated by means of reactive and nonreactive sputtering of Al2O3. Homogeneous multilayer structures were seen to possess superior mechanical stability than single-layered films. The multilayer films presented 50% improved barrier performance and the fabrication process was 40% faster compared with single Al2O3 layers of the same thickness. The water vapor transmission rate was enhanced up to the order of 10-4 g m-2 day-1 from a three-pair system of reactive and nonreactive sputtered Al2O3 bilayers.

AB - Homogeneous multilayered barrier films were fabricated by means of reactive and nonreactive sputtering of Al2O3. Homogeneous multilayer structures were seen to possess superior mechanical stability than single-layered films. The multilayer films presented 50% improved barrier performance and the fabrication process was 40% faster compared with single Al2O3 layers of the same thickness. The water vapor transmission rate was enhanced up to the order of 10-4 g m-2 day-1 from a three-pair system of reactive and nonreactive sputtered Al2O3 bilayers.

KW - Amorphous oxides

KW - Gas barrier

KW - Internal stresses

KW - Multilayer thin films

KW - Sputtering

UR - https://www.scopus.com/pages/publications/74749085859

U2 - 10.1016/j.scriptamat.2009.12.006

DO - 10.1016/j.scriptamat.2009.12.006

M3 - Article

AN - SCOPUS:74749085859

SN - 1359-6462

VL - 62

SP - 447

EP - 450

JO - Scripta Materialia

JF - Scripta Materialia

IS - 7

ER -

Homogeneous Al₂O₃ multilayer structures with reinforced mechanical stability for high-performance and high-throughput thin-film encapsulation

Abstract

Keywords

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