Highly selective etching of SnO 2 absorber in binary mask structure for extreme ultra-violet lithography
- Soo Jin Lee
- , Chang Yong Jung
- , Sung Jin Park
- , Chang Kweun Hwangbo
- , Hwan Seok Seo
- , Sung Soo Kim
- , Nae Eung Lee
- Sungkyunkwan University
- Inha University
- Samsung
Research output: Contribution to journal › Article › peer-review