Highly efficient visible hologram through dielectric metasurface

To achieve applied aspect of metasurfaces in the visible regime, dielectric materials with low absorption are indispensable. This work presents highly efficient generation of hologram via processed amorphous silicon, which exhibits significantly low absorption in the region of interest. The phase and the polarization of transmitted light are tailored by varying the orientation of dielectric nanorods whereas their conversion efficiency is optimized by adjusting their structural parameters. Better image fidelity and higher conversion efficiency (up-to 75%) are achieved as compared to previously reported work. The proposed design methodology paves a way toward on-chip realization of various novel phenomena with substantially enhanced performance.