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High Volatile Antimony(III) Precursors for Metal Oxide Thin Film Deposition

  • Ji Seoung Jeong
  • , Sunyoung Shin
  • , Bo Keun Park
  • , Seung Uk Son
  • , Taek Mo Chung
  • , Ji Yeon Ryu
  • Korea Research Institute of Chemical Technology
  • Sungkyunkwan University
  • University of Science and Technology UST

Research output: Contribution to journalArticlepeer-review

Abstract

We report the synthesis and characterization of novel antimony(III) complexes: Sb(mpa)3 (1), Sb(mmpa)3 (2), Sb(mdpa)3 (3), Sb(epa)3 (4), Sb(empa)3 (5), and Sb(edpa)3 (6) (mpa = N-methoxypropanamide, mmpa = N-methoxy-2-methyl-propanamide, mdpa = N-methoxy-2,2-dimethylpropanamide, epa = N-ethoxypropanamide, empa = N-ethoxy-2-methylpropanamide, and edpa = N-ethoxy-2,2-dimethylpropanamide, via a salt-elimination reaction with SbCl3 and sodium-substituted carboxamide. The molecular structure of 6 revealed the formation of a homoleptic conformer with a highly distorted pentagonal bipyramidal geometry, as determined by X-ray crystallography. Thermogravimetric analysis showed excellent volatility at elevated temperatures, with complex 4 displaying the lowest residual mass of 0.16% at 500 °C. For complexes 4, 5, and 6, the temperature at a vapor pressure of 1 Torr and the enthalpy of vaporization were estimated to be 58, 64, and 45 °C and 83.31, 103.58, and 99.93 kJ/mol, respectively.

Original languageEnglish
Pages (from-to)31871-31877
Number of pages7
JournalACS Omega
Volume9
Issue number29
DOIs
StatePublished - 23 Jul 2024

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