Skip to main navigation Skip to search Skip to main content

High-speed etching of amorphous silicon using pin-to-plate dielectric barrier discharge

  • Sungkyunkwan University
  • Samsung

Research output: Contribution to journal › Article › peer-review

6   Link opens in a new tab Scopus citations

Fingerprint

Dive into the research topics of 'High-speed etching of amorphous silicon using pin-to-plate dielectric barrier discharge'. Together they form a unique fingerprint.
Sort by

Engineering

Material Science