High Performance p-Type TFT with Metal Halide Semiconductors

Research output: Contribution to journalConference articlepeer-review

Abstract

To develop high performance p-type electronic materials, we have investigated about high mobility metal halide semiconductors, such as CuI and CsSnI3. The facile Cu and I vacancy generations in CuI hinder the proper control of electrical properties of CuI. We have developed the mild processing of CuI with solution precursor, which enabled high performance thin-film transistor (mobility ~2 cm2/Vs) and high electrical conductivity ( > 500 S/cm). Moreover, the optimized CsSnI3 TFT exhibit field-effect hole mobility of over 50 cm2/Vs and on/off current ratios exceeding 108, as well as high operational stability and reproducibility.

Original languageEnglish
Pages (from-to)573-575
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume54
Issue number1
DOIs
StatePublished - 2023
EventSID International Symposium Digest of Technical Papers, 2023 - Los Angeles, United States
Duration: 21 May 202326 May 2023

Keywords

  • CuI
  • halide perovskite
  • p-type TFT

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