Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer

Woochang Song; Dong Gun Lim; Hee Dong Kim; Jae Hyeoung Lee; Jaesang Cha; Gooman Park; Eun Chang Choi; Hyun Suk Hwang; Hyung Jun Cho; Byungyou Hong; Won Seok Choi

doi:10.3938/jkps.53.2142

Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer

Woochang Song, Dong Gun Lim, Hee Dong Kim, Jae Hyeoung Lee, Jaesang Cha, Gooman Park, Eun Chang Choi, Hyun Suk Hwang, Hyung Jun Cho, Byungyou Hong, Won Seok Choi

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

An amorphous carbon (a-C) thin film was used as a catalyst layer to grow metal-free carbon nanotubes (CNTs). The a-C films were deposited with a closed-field unbalanced magnetron (CFUBM) sputtering method on Si substrates. The CNTs were prepared using a microwave plasma-enhanced chemical-vapor deposition (MPECVD) method with an a-C catalyst film coated onto a silicon substrate by using methane (CH₄) and hydrogen (H₂) gas. The CNTs were grown at different temperatures (550°C, 650°C and 750°C), with other conditions being held constant. Field emission scanning electron microscopy (FE-SEM) images showed growth trend of the CNTs against temperature. High-resolution transmission electron microscopy (HR-TEM) images showed the CNTs to be multi-walled. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted solely of carbon.

Original language	English
Pages (from-to)	2142-2146
Number of pages	5
Journal	Journal of the Korean Physical Society
Volume	53
Issue number	4
DOIs	https://doi.org/10.3938/jkps.53.2142
State	Published - Oct 2008
Externally published	Yes

Keywords

Amorphous carbon
Carbon nanotube (CNT)
Catalyst
Closed-field unbalanced magnetron (CFUBM)
Microwave plasma-enhanced chemical-vapor deposition (MPECVD)

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10.3938/jkps.53.2142

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title = "Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer",

abstract = "An amorphous carbon (a-C) thin film was used as a catalyst layer to grow metal-free carbon nanotubes (CNTs). The a-C films were deposited with a closed-field unbalanced magnetron (CFUBM) sputtering method on Si substrates. The CNTs were prepared using a microwave plasma-enhanced chemical-vapor deposition (MPECVD) method with an a-C catalyst film coated onto a silicon substrate by using methane (CH4) and hydrogen (H2) gas. The CNTs were grown at different temperatures (550°C, 650°C and 750°C), with other conditions being held constant. Field emission scanning electron microscopy (FE-SEM) images showed growth trend of the CNTs against temperature. High-resolution transmission electron microscopy (HR-TEM) images showed the CNTs to be multi-walled. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted solely of carbon.",

keywords = "Amorphous carbon, Carbon nanotube (CNT), Catalyst, Closed-field unbalanced magnetron (CFUBM), Microwave plasma-enhanced chemical-vapor deposition (MPECVD)",

author = "Woochang Song and Lim, \{Dong Gun\} and Kim, \{Hee Dong\} and Lee, \{Jae Hyeoung\} and Jaesang Cha and Gooman Park and Choi, \{Eun Chang\} and Hwang, \{Hyun Suk\} and Cho, \{Hyung Jun\} and Byungyou Hong and Choi, \{Won Seok\}",

year = "2008",

month = oct,

doi = "10.3938/jkps.53.2142",

language = "English",

volume = "53",

pages = "2142--2146",

journal = "Journal of the Korean Physical Society",

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publisher = "Korean Physical Society",

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T1 - Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer

AU - Song, Woochang

AU - Lim, Dong Gun

AU - Kim, Hee Dong

AU - Lee, Jae Hyeoung

AU - Cha, Jaesang

AU - Park, Gooman

AU - Choi, Eun Chang

AU - Hwang, Hyun Suk

AU - Cho, Hyung Jun

AU - Hong, Byungyou

AU - Choi, Won Seok

PY - 2008/10

Y1 - 2008/10

N2 - An amorphous carbon (a-C) thin film was used as a catalyst layer to grow metal-free carbon nanotubes (CNTs). The a-C films were deposited with a closed-field unbalanced magnetron (CFUBM) sputtering method on Si substrates. The CNTs were prepared using a microwave plasma-enhanced chemical-vapor deposition (MPECVD) method with an a-C catalyst film coated onto a silicon substrate by using methane (CH4) and hydrogen (H2) gas. The CNTs were grown at different temperatures (550°C, 650°C and 750°C), with other conditions being held constant. Field emission scanning electron microscopy (FE-SEM) images showed growth trend of the CNTs against temperature. High-resolution transmission electron microscopy (HR-TEM) images showed the CNTs to be multi-walled. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted solely of carbon.

AB - An amorphous carbon (a-C) thin film was used as a catalyst layer to grow metal-free carbon nanotubes (CNTs). The a-C films were deposited with a closed-field unbalanced magnetron (CFUBM) sputtering method on Si substrates. The CNTs were prepared using a microwave plasma-enhanced chemical-vapor deposition (MPECVD) method with an a-C catalyst film coated onto a silicon substrate by using methane (CH4) and hydrogen (H2) gas. The CNTs were grown at different temperatures (550°C, 650°C and 750°C), with other conditions being held constant. Field emission scanning electron microscopy (FE-SEM) images showed growth trend of the CNTs against temperature. High-resolution transmission electron microscopy (HR-TEM) images showed the CNTs to be multi-walled. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted solely of carbon.

KW - Amorphous carbon

KW - Carbon nanotube (CNT)

KW - Catalyst

KW - Closed-field unbalanced magnetron (CFUBM)

KW - Microwave plasma-enhanced chemical-vapor deposition (MPECVD)

UR - https://www.scopus.com/pages/publications/55949089694

U2 - 10.3938/jkps.53.2142

DO - 10.3938/jkps.53.2142

M3 - Article

AN - SCOPUS:55949089694

SN - 0374-4884

VL - 53

SP - 2142

EP - 2146

JO - Journal of the Korean Physical Society

JF - Journal of the Korean Physical Society

IS - 4

ER -

Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer

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Keywords

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