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Formation of reliable HfO2/HfSixOy gate-dielectric for metal-oxide-semiconductor devices

  • Yong Chun Quan
  • , Jang Eun Lee
  • , Hyeoksu Kang
  • , Yonghan Roh
  • , Donggeun Jung
  • , Cheol Woong Yang
  • Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

28   Link opens in a new tab Scopus citations

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