Flexible Carbon-rich Al2O3 Interlayers for Moisture Barrier Films by a Spatially-Resolved Atomic Layer Deposition Process

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Abstract

In this study, we developed effective carbon-rich Al2O3 interlayers for flexible moisture barrier films. The carbon-rich Al2O3 films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al2O3 and carbon-rich Al2O3 and the water vapor transmission rate (WVTR) of 3.3 × 10 −4 g/(m2·day) was demonstrated. The WVTR of the multilayer films is reduced by 36% compared to 25 nm thick single Al2O3 barrier film. The WVTR of the five-layer film shows increase of 86% after 1,000 bending at a 1.5 cm radius, while single Al2O3 thin films increased by 367%.

Original languageEnglish
Pages (from-to)40-44
Number of pages5
JournalJournal of the Korean Physical Society
Volume73
Issue number1
DOIs
StatePublished - 1 Jul 2018

Keywords

  • Carbon-rich AlO Interlayer
  • Encapsulation
  • Flexible Multilayer Films
  • Moisture Multilayer Barrier Films

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