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Fabrication of organic-inorganic hybrid moisture-barrier film for OLEDs

  • Sungkyunkwan University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We fabricated moisture-barrier films using ALD and plasma enhanced CVD method for OELD encapsulation. The ZrÛ2 inorganic layer was deposited on PEN substrate using TEMAZ (Tetrakis(ethylmethylamino) zirconium) precursor. The organic layer was grown with n-hexane precursor. The moisture-barrier property and flexibility were measured by Ca test and bending test.

Original languageEnglish
Title of host publication21st International Display Workshops 2014, IDW 2014
PublisherSociety for Information Display
Pages1506-1507
Number of pages2
ISBN (Electronic)9781510827790
StatePublished - 2014
Event21st International Display Workshops 2014, IDW 2014 - Niigata, Japan
Duration: 3 Dec 20145 Dec 2014

Publication series

Name21st International Display Workshops 2014, IDW 2014
Volume2

Conference

Conference21st International Display Workshops 2014, IDW 2014
Country/TerritoryJapan
CityNiigata
Period3/12/145/12/14

Keywords

  • Atomic layer deposition
  • Encapsulation
  • Plasma enhanced CVD

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