Fabrication of in situ patterned iron oxide films using micro contact printing and selective deposition

Hyunjung Shin; Hyejin Im; Jong Up Jeon; Eung Soo Kim; Y. Eugene Pak

doi:10.1080/10587250108024786

Fabrication of in situ patterned iron oxide films using micro contact printing and selective deposition

Hyunjung Shin
, Hyejin Im
, Jong Up Jeon
, Eung Soo Kim
, Y. Eugene Pak

Samsung
Yonsei University
Kyonggi University

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

In situ patterning of iron oxide thin layers were fabricated via micro-contact printing (μCP) and selective area deposition. μCP is used to pattern two different surface moieties of self-assembled organic monolayers (SAMs) on Au/Cr/Si substrates. An elastomeric stamp is used to transfer Hydrophobic (hexadecanethiol (HOT)) SAMs that are to sustain deposition of iron oxide precipitates. Hydrophilic (dithiothreitol, DTT) SAMs were used to induce crystalline iron oxide films. 0.05 M of iron nitrate (Fe(NO₃)₃·9H₂O) aqueous solutions containing urea under nitric acid (pH < 2) were used. Selective depositions were realized through precipitation of crystalline iron oxides at ambient temperature (80°C) onto the mixed SAM surfaces.

Original language	English
Pages (from-to)	473-476
Number of pages	4
Journal	Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume	371
DOIs	https://doi.org/10.1080/10587250108024786
State	Published - 2001
Externally published	Yes

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Keywords

In situ patterning
Iron oxide films
Micro-contact printing
Selective deposition
Self-assembled organic monolayers

Access to Document

10.1080/10587250108024786

Cite this

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title = "Fabrication of in situ patterned iron oxide films using micro contact printing and selective deposition",

abstract = "In situ patterning of iron oxide thin layers were fabricated via micro-contact printing (μCP) and selective area deposition. μCP is used to pattern two different surface moieties of self-assembled organic monolayers (SAMs) on Au/Cr/Si substrates. An elastomeric stamp is used to transfer Hydrophobic (hexadecanethiol (HOT)) SAMs that are to sustain deposition of iron oxide precipitates. Hydrophilic (dithiothreitol, DTT) SAMs were used to induce crystalline iron oxide films. 0.05 M of iron nitrate (Fe(NO3)3·9H2O) aqueous solutions containing urea under nitric acid (pH < 2) were used. Selective depositions were realized through precipitation of crystalline iron oxides at ambient temperature (80°C) onto the mixed SAM surfaces.",

keywords = "In situ patterning, Iron oxide films, Micro-contact printing, Selective deposition, Self-assembled organic monolayers",

author = "Hyunjung Shin and Hyejin Im and Jeon, \{Jong Up\} and Kim, \{Eung Soo\} and Pak, \{Y. Eugene\}",

year = "2001",

doi = "10.1080/10587250108024786",

language = "English",

volume = "371",

pages = "473--476",

journal = "Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals",

issn = "1058-725X",

publisher = "Taylor and Francis Ltd.",

}

TY - JOUR

T1 - Fabrication of in situ patterned iron oxide films using micro contact printing and selective deposition

AU - Shin, Hyunjung

AU - Im, Hyejin

AU - Jeon, Jong Up

AU - Kim, Eung Soo

AU - Pak, Y. Eugene

PY - 2001

Y1 - 2001

N2 - In situ patterning of iron oxide thin layers were fabricated via micro-contact printing (μCP) and selective area deposition. μCP is used to pattern two different surface moieties of self-assembled organic monolayers (SAMs) on Au/Cr/Si substrates. An elastomeric stamp is used to transfer Hydrophobic (hexadecanethiol (HOT)) SAMs that are to sustain deposition of iron oxide precipitates. Hydrophilic (dithiothreitol, DTT) SAMs were used to induce crystalline iron oxide films. 0.05 M of iron nitrate (Fe(NO3)3·9H2O) aqueous solutions containing urea under nitric acid (pH < 2) were used. Selective depositions were realized through precipitation of crystalline iron oxides at ambient temperature (80°C) onto the mixed SAM surfaces.

AB - In situ patterning of iron oxide thin layers were fabricated via micro-contact printing (μCP) and selective area deposition. μCP is used to pattern two different surface moieties of self-assembled organic monolayers (SAMs) on Au/Cr/Si substrates. An elastomeric stamp is used to transfer Hydrophobic (hexadecanethiol (HOT)) SAMs that are to sustain deposition of iron oxide precipitates. Hydrophilic (dithiothreitol, DTT) SAMs were used to induce crystalline iron oxide films. 0.05 M of iron nitrate (Fe(NO3)3·9H2O) aqueous solutions containing urea under nitric acid (pH < 2) were used. Selective depositions were realized through precipitation of crystalline iron oxides at ambient temperature (80°C) onto the mixed SAM surfaces.

KW - In situ patterning

KW - Iron oxide films

KW - Micro-contact printing

KW - Selective deposition

KW - Self-assembled organic monolayers

UR - https://www.scopus.com/pages/publications/12444279157

U2 - 10.1080/10587250108024786

DO - 10.1080/10587250108024786

M3 - Article

AN - SCOPUS:12444279157

SN - 1058-725X

VL - 371

SP - 473

EP - 476

JO - Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

ER -

Fabrication of in situ patterned iron oxide films using micro contact printing and selective deposition

Abstract

UN SDGs

Keywords

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