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Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design

  • Hyung Youl Park
  • , Woo Shik Jung
  • , Dong Ho Kang
  • , Jaeho Jeon
  • , Gwangwe Yoo
  • , Yongkook Park
  • , Jinhee Lee
  • , Yun Hee Jang
  • , Jaeho Lee
  • , Seongjun Park
  • , Hyun Yong Yu
  • , Byungha Shin
  • , Sungjoo Lee
  • , Jin Hong Park
  • Sungkyunkwan University
  • Stanford University
  • Gwangju Institute of Science and Technology
  • Samsung
  • Korea University
  • Korea Advanced Institute of Science and Technology

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)864-870
Number of pages7
JournalAdvanced Materials
Volume28
Issue number5
DOIs
StatePublished - Feb 2016

Keywords

  • contact resistance
  • doping
  • edge contact
  • graphene
  • optoelectronic devices

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