Abstract
Si-waveguide-integrated lateral Ge p-i-n photodetectors using novel Si/ SiGe buffer and two-step Ge-process are demonstrated for the first time. Comparative analysis between lateral Ge p-i-n and vertical p-Si/i-Ge/ n-Ge p-i-n is made. Light is evanescently coupled from Si waveguide to the overlaying Ge-detector, achieving high responsivity of 1.16 A/W at 1550 nm with f3db bandwidth of 3.4 GHz for lateral Ge p-i-n detector at 5 V reverse bias. In contrast, vertical p-Si/i-Ge/n-Ge p-i-n has lower responsivity of 0.29 A/W but higher bandwidth of 5.5 GHz at 5 V bias. The higher responsivity of lateral p-i-n detectors is attributed to smaller optical mode overlap with highly doped Ge region as in vertical p-i-n configuration.
| Original language | English |
|---|---|
| Pages (from-to) | 445-448 |
| Number of pages | 4 |
| Journal | IEEE Electron Device Letters |
| Volume | 29 |
| Issue number | 5 |
| DOIs | |
| State | Published - May 2008 |
| Externally published | Yes |
Keywords
- Evanescent-coupled
- Lateral p-i-n
- Vertical p-i-n
- Waveguide Ge-photodetector
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