Etching of CoFeB using CO/N H3 in an inductively coupled plasma etching system
- Jong Yoon Park
- , Se Koo Kang
- , Min Hwan Jeon
- , Myung S. Jhon
- , Geun Young Yeom
Research output: Contribution to journal › Article › peer-review
38
Link opens in a new tab
Scopus
citations