Etching characteristics of SrBi2Ta2O9 film with Ar/CHF3 plasma
- Jung Woo Seo
- , Do Haing Lee
- , Won Jae Lee
- , Byoung Gon Yu
- , Kwang Ho Kwon
- , Geun Young Yeom
- , Eui Goo Chang
- , Chang Il Kim
Research output: Contribution to journal › Conference article › peer-review
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