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Etching Characteristics and Mechanism of SiNx films for nano-devices in CH2F2/O2/Ar inductively coupled plasma: Effect of O2 mixing ratio

  • Jinyoung Son
  • , Alexander Efremov
  • , Sun Jin Yun
  • , Geun Young Yeom
  • , Kwang Ho Kwon
  • Korea University
  • Ivanovo State University of Chemical Technology
  • Electronics and Telecommunications Research Institute

Research output: Contribution to journal › Article › peer-review

16   Link opens in a new tab Scopus citations

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