Etch-induced damage in single crystal Si trench etching by planar inductively coupled Cl2/N2 and Cl2/HBr plasmas

  • Y. J. Lee
  • , S. W. Hwang
  • , G. Y. Yeom
  • , J. W. Lee
  • , J. Y. Lee

Research output: Contribution to journal › Conference article › peer-review

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