Abstract
Overlay in upper layer with respect to lower layer need to be measured and controlled with sub-nanometer-level accuracy in semiconductor manufacturing process. However, as the metrology to device (MTD) deviation continues to increase, there is a growing need to maintain and improve MTD variation. In this study, we propose a methodology utilizing COMSOL Multiphysics to directly track process changes and quantify their impact. It can realize actual measurement equipment setting and modify optical property. We will introduce device matching methods that can improve MTD on product wafers through optical simulations.
| Original language | English |
|---|---|
| Title of host publication | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII |
| Editors | Georg von Freymann, Eva Blasco, Debashis Chanda |
| Publisher | SPIE |
| ISBN (Electronic) | 9781510670563 |
| DOIs | |
| State | Published - 2024 |
| Event | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII 2024 - San Francisco, United States Duration: 28 Jan 2024 → 31 Jan 2024 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 12898 |
| ISSN (Print) | 0277-786X |
| ISSN (Electronic) | 1996-756X |
Conference
| Conference | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII 2024 |
|---|---|
| Country/Territory | United States |
| City | San Francisco |
| Period | 28/01/24 → 31/01/24 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 9 Industry, Innovation, and Infrastructure
Keywords
- COMSOL Multiphysics
- MTD
- Overlay
- simulation
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