Abstract
We fabricated organic photovoltaic (OPV) based on ZnO ripple structure on indium tin oxide as electroncollecting layers and PTB7-F20 as donor polymer. In addition, atomic layer deposition (ALD) was used for preparing additional ZnO layers on rippled ZnO. Addition of 2 nm-thick ALD-ZnO resulted in enhanced initial OPV performance and stability. Based on photoluminescence results, we suggest that ALD-ZnO layers reduced number of surface defect sites on ZnO, which can act as electron-hole recombination center of OPV, and increased resistance of ZnO towards surface defect formation.
| Original language | English |
|---|---|
| Pages (from-to) | 353-356 |
| Number of pages | 4 |
| Journal | Bulletin of the Korean Chemical Society |
| Volume | 35 |
| Issue number | 2 |
| DOIs | |
| State | Published - 20 Feb 2014 |
Keywords
- Atomic layer deposition
- Organic photovoltaic
- Stability
- Surface defect
- Zno