Electrical and optical properties of ITO:Ca composite thin films for TEOLED cathode

W. S. Jung; S. G. Yoon; S. M. Kang; S. W. Kim; D. H. Yoon

doi:10.1016/j.tsf.2007.07.070

Electrical and optical properties of ITO:Ca composite thin films for TEOLED cathode

W. S. Jung
, S. G. Yoon
, S. M. Kang
, S. W. Kim
, D. H. Yoon

Department of Advanced Materials Science and Engineering

Sungkyunkwan University
Kumoh National Institute of Technology

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

ITO:Ca composite thin films were deposited on glass substrate by the rf magnetron co-sputtering method with various numbers of Ca chips and oxygen partial pressures. The carrier concentration of the ITO:Ca thin film was 7 × 10²⁰ cm^{- 3} when the number of Ca chips was 4 at an oxygen partial pressure of 1.4%. The sheet resistance and optical transmittance of the ITO:Ca thin films were 68.2 Ω/sq. and 87%, respectively. The work function of the ITO:Ca thin films with 8 Ca chips was changed from 4.6 eV to 5.0 eV when the oxygen partial pressure was increased from 0.8% to 2.2%. When the oxygen partial pressure was 1.2%, a low work function of 4.6 eV was obtained for the ITO:Ca thin films.

Original language	English
Pages (from-to)	5445-5448
Number of pages	4
Journal	Thin Solid Films
Volume	516
Issue number	16
DOIs	https://doi.org/10.1016/j.tsf.2007.07.070
State	Published - 30 Jun 2008

Keywords

Co-sputtering
Transparent cathode
Work function

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10.1016/j.tsf.2007.07.070

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title = "Electrical and optical properties of ITO:Ca composite thin films for TEOLED cathode",

abstract = "ITO:Ca composite thin films were deposited on glass substrate by the rf magnetron co-sputtering method with various numbers of Ca chips and oxygen partial pressures. The carrier concentration of the ITO:Ca thin film was 7 × 1020 cm- 3 when the number of Ca chips was 4 at an oxygen partial pressure of 1.4\%. The sheet resistance and optical transmittance of the ITO:Ca thin films were 68.2 Ω/sq. and 87\%, respectively. The work function of the ITO:Ca thin films with 8 Ca chips was changed from 4.6 eV to 5.0 eV when the oxygen partial pressure was increased from 0.8\% to 2.2\%. When the oxygen partial pressure was 1.2\%, a low work function of 4.6 eV was obtained for the ITO:Ca thin films.",

keywords = "Co-sputtering, Transparent cathode, Work function",

author = "Jung, \{W. S.\} and Yoon, \{S. G.\} and Kang, \{S. M.\} and Kim, \{S. W.\} and Yoon, \{D. H.\}",

year = "2008",

month = jun,

day = "30",

doi = "10.1016/j.tsf.2007.07.070",

language = "English",

volume = "516",

pages = "5445--5448",

journal = "Thin Solid Films",

issn = "0040-6090",

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TY - JOUR

T1 - Electrical and optical properties of ITO:Ca composite thin films for TEOLED cathode

AU - Jung, W. S.

AU - Yoon, S. G.

AU - Kang, S. M.

AU - Kim, S. W.

AU - Yoon, D. H.

PY - 2008/6/30

Y1 - 2008/6/30

N2 - ITO:Ca composite thin films were deposited on glass substrate by the rf magnetron co-sputtering method with various numbers of Ca chips and oxygen partial pressures. The carrier concentration of the ITO:Ca thin film was 7 × 1020 cm- 3 when the number of Ca chips was 4 at an oxygen partial pressure of 1.4%. The sheet resistance and optical transmittance of the ITO:Ca thin films were 68.2 Ω/sq. and 87%, respectively. The work function of the ITO:Ca thin films with 8 Ca chips was changed from 4.6 eV to 5.0 eV when the oxygen partial pressure was increased from 0.8% to 2.2%. When the oxygen partial pressure was 1.2%, a low work function of 4.6 eV was obtained for the ITO:Ca thin films.

AB - ITO:Ca composite thin films were deposited on glass substrate by the rf magnetron co-sputtering method with various numbers of Ca chips and oxygen partial pressures. The carrier concentration of the ITO:Ca thin film was 7 × 1020 cm- 3 when the number of Ca chips was 4 at an oxygen partial pressure of 1.4%. The sheet resistance and optical transmittance of the ITO:Ca thin films were 68.2 Ω/sq. and 87%, respectively. The work function of the ITO:Ca thin films with 8 Ca chips was changed from 4.6 eV to 5.0 eV when the oxygen partial pressure was increased from 0.8% to 2.2%. When the oxygen partial pressure was 1.2%, a low work function of 4.6 eV was obtained for the ITO:Ca thin films.

KW - Co-sputtering

KW - Transparent cathode

KW - Work function

UR - https://www.scopus.com/pages/publications/43949086016

U2 - 10.1016/j.tsf.2007.07.070

DO - 10.1016/j.tsf.2007.07.070

M3 - Article

AN - SCOPUS:43949086016

SN - 0040-6090

VL - 516

SP - 5445

EP - 5448

JO - Thin Solid Films

JF - Thin Solid Films

IS - 16

ER -

Electrical and optical properties of ITO:Ca composite thin films for TEOLED cathode

Abstract

Keywords

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