TY - GEN
T1 - Efficient improvement of sensing performance using charge storage engineering in low noise FET-type gas sensors
AU - Shin, Wonjun
AU - Hong, Seongbin
AU - Jeong, Yujeong
AU - Jung, Gyuweon
AU - Park, Jinwoo
AU - Kwon, Dongseok
AU - Jang, Dongkyu
AU - Kim, Donghee
AU - Park, Byung Gook
AU - Lee, Jong Ho
N1 - Publisher Copyright:
© 2020 IEEE.
PY - 2020/12/12
Y1 - 2020/12/12
N2 - A novel charge storage engineering (CSE) using program/erase (P/E) operation for improving the sensing performance of FET-type gas sensors with floating-gate is proposed for the first time. The responses of the sensors to NO2 and H2S gases are significantly improved when the sensors are set at programmed (holes stored) and erased (electrons stored) states, respectively. The sensor, fabricated simply using 6 masks, has a 1/f noise (SID/ID2) that is ~103 times lower than that of resistor-type gas sensor fabricated on the same substrate, and is resistant to P/E F-N stress. The proposed CSE not only improves the response and limit of detection, but also allows selectivity for NO2 and H2S gases up to 5 and 6 times, respectively.
AB - A novel charge storage engineering (CSE) using program/erase (P/E) operation for improving the sensing performance of FET-type gas sensors with floating-gate is proposed for the first time. The responses of the sensors to NO2 and H2S gases are significantly improved when the sensors are set at programmed (holes stored) and erased (electrons stored) states, respectively. The sensor, fabricated simply using 6 masks, has a 1/f noise (SID/ID2) that is ~103 times lower than that of resistor-type gas sensor fabricated on the same substrate, and is resistant to P/E F-N stress. The proposed CSE not only improves the response and limit of detection, but also allows selectivity for NO2 and H2S gases up to 5 and 6 times, respectively.
UR - https://www.scopus.com/pages/publications/85102961686
U2 - 10.1109/IEDM13553.2020.9371920
DO - 10.1109/IEDM13553.2020.9371920
M3 - Conference contribution
AN - SCOPUS:85102961686
T3 - Technical Digest - International Electron Devices Meeting, IEDM
SP - 35.3.1-35.3.4
BT - 2020 IEEE International Electron Devices Meeting, IEDM 2020
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 66th Annual IEEE International Electron Devices Meeting, IEDM 2020
Y2 - 12 December 2020 through 18 December 2020
ER -