Effects of process parameter for LiNbO3 optical waveguide prepared by neutral loop discharge plasma etching

W. J. Park; S. G. Yoon; D. H. Yoon; W. S. Yang

Effects of process parameter for LiNbO₃ optical waveguide prepared by neutral loop discharge plasma etching

W. J. Park
, S. G. Yoon
, D. H. Yoon
, W. S. Yang

Department of Advanced Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

A plasma dry etching technique was applied to the fabrication of ridge-shaped LiNbO₃ optical waveguides for broadband operation. The etching characteristics of the fabricated LiNbO₃ optical waveguides were investigated as functions of the Ar/C₃F₈ flow ratio and the antenna power by using a neutral loop discharge plasma etcher. Especially, the optimal etching conditions of the ridge shaped LiNbO₃ optical waveguide were found to be a C₃F₈ gas flow ratio of 0.2 and an antenna power of 600 W.

Original language	English
Pages (from-to)	1951-1954
Number of pages	4
Journal	Journal of the Korean Physical Society
Volume	49
Issue number	5
State	Published - Nov 2006

Keywords

Antenna power
CF gas flow ratio
LiNbO
Ridge-shaped optical waveguide

Cite this

@article{0d75f7c213e24c4fa6674cfd9b202e88,

title = "Effects of process parameter for LiNbO3 optical waveguide prepared by neutral loop discharge plasma etching",

abstract = "A plasma dry etching technique was applied to the fabrication of ridge-shaped LiNbO3 optical waveguides for broadband operation. The etching characteristics of the fabricated LiNbO3 optical waveguides were investigated as functions of the Ar/C3F8 flow ratio and the antenna power by using a neutral loop discharge plasma etcher. Especially, the optimal etching conditions of the ridge shaped LiNbO3 optical waveguide were found to be a C3F8 gas flow ratio of 0.2 and an antenna power of 600 W.",

keywords = "Antenna power, CF gas flow ratio, LiNbO, Ridge-shaped optical waveguide",

author = "Park, \{W. J.\} and Yoon, \{S. G.\} and Yoon, \{D. H.\} and Yang, \{W. S.\}",

year = "2006",

month = nov,

language = "English",

volume = "49",

pages = "1951--1954",

journal = "Journal of the Korean Physical Society",

issn = "0374-4884",

publisher = "Korean Physical Society",

number = "5",

}

TY - JOUR

T1 - Effects of process parameter for LiNbO3 optical waveguide prepared by neutral loop discharge plasma etching

AU - Park, W. J.

AU - Yoon, S. G.

AU - Yoon, D. H.

AU - Yang, W. S.

PY - 2006/11

Y1 - 2006/11

N2 - A plasma dry etching technique was applied to the fabrication of ridge-shaped LiNbO3 optical waveguides for broadband operation. The etching characteristics of the fabricated LiNbO3 optical waveguides were investigated as functions of the Ar/C3F8 flow ratio and the antenna power by using a neutral loop discharge plasma etcher. Especially, the optimal etching conditions of the ridge shaped LiNbO3 optical waveguide were found to be a C3F8 gas flow ratio of 0.2 and an antenna power of 600 W.

AB - A plasma dry etching technique was applied to the fabrication of ridge-shaped LiNbO3 optical waveguides for broadband operation. The etching characteristics of the fabricated LiNbO3 optical waveguides were investigated as functions of the Ar/C3F8 flow ratio and the antenna power by using a neutral loop discharge plasma etcher. Especially, the optimal etching conditions of the ridge shaped LiNbO3 optical waveguide were found to be a C3F8 gas flow ratio of 0.2 and an antenna power of 600 W.

KW - Antenna power

KW - CF gas flow ratio

KW - LiNbO

KW - Ridge-shaped optical waveguide

UR - https://www.scopus.com/pages/publications/33845564291

M3 - Article

AN - SCOPUS:33845564291

SN - 0374-4884

VL - 49

SP - 1951

EP - 1954

JO - Journal of the Korean Physical Society

JF - Journal of the Korean Physical Society

IS - 5

ER -

Effects of process parameter for LiNbO₃ optical waveguide prepared by neutral loop discharge plasma etching

Abstract

Keywords

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