Effects of ion damage on the surface of ITO films during plasma treatment

Hyunjung Shin; Chanhyung Kim; Changdeuck Bae; Jang Sik Lee; Jaegab Lee; Sunghan Kim

doi:10.1016/j.apsusc.2007.05.029

Effects of ion damage on the surface of ITO films during plasma treatment

Hyunjung Shin, Chanhyung Kim, Changdeuck Bae, Jang Sik Lee, Jaegab Lee, Sunghan Kim

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

During a surface treatment using CF ₄ /O ₂ gas plasma, energetic ions affected the defect structures on the top surface of ITO thin films. C-AFM and local I-V measurements showed the formation of the depleted layer after a plasma treatment with a bias of 20 W; XPS showed the creation of new defect structures. Donor concentration in the damaged top surface of the ITO films was found to be decreased. Sn-based neutral defect complexes and reduced oxygen, which could trap the electrons, have been proposed to be formed. This can also explain the increase of the work function of ITO.

Original language	English
Pages (from-to)	8928-8932
Number of pages	5
Journal	Applied Surface Science
Volume	253
Issue number	22
DOIs	https://doi.org/10.1016/j.apsusc.2007.05.029
State	Published - 15 Sep 2007
Externally published	Yes

Keywords

Conducting atomic force microscopy
Ion damage
ITO

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10.1016/j.apsusc.2007.05.029

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title = "Effects of ion damage on the surface of ITO films during plasma treatment",

abstract = " During a surface treatment using CF 4 /O 2 gas plasma, energetic ions affected the defect structures on the top surface of ITO thin films. C-AFM and local I-V measurements showed the formation of the depleted layer after a plasma treatment with a bias of 20 W; XPS showed the creation of new defect structures. Donor concentration in the damaged top surface of the ITO films was found to be decreased. Sn-based neutral defect complexes and reduced oxygen, which could trap the electrons, have been proposed to be formed. This can also explain the increase of the work function of ITO.",

keywords = "Conducting atomic force microscopy, Ion damage, ITO",

author = "Hyunjung Shin and Chanhyung Kim and Changdeuck Bae and Lee, \{Jang Sik\} and Jaegab Lee and Sunghan Kim",

year = "2007",

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doi = "10.1016/j.apsusc.2007.05.029",

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journal = "Applied Surface Science",

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T1 - Effects of ion damage on the surface of ITO films during plasma treatment

AU - Shin, Hyunjung

AU - Kim, Chanhyung

AU - Bae, Changdeuck

AU - Lee, Jang Sik

AU - Lee, Jaegab

AU - Kim, Sunghan

PY - 2007/9/15

Y1 - 2007/9/15

N2 - During a surface treatment using CF 4 /O 2 gas plasma, energetic ions affected the defect structures on the top surface of ITO thin films. C-AFM and local I-V measurements showed the formation of the depleted layer after a plasma treatment with a bias of 20 W; XPS showed the creation of new defect structures. Donor concentration in the damaged top surface of the ITO films was found to be decreased. Sn-based neutral defect complexes and reduced oxygen, which could trap the electrons, have been proposed to be formed. This can also explain the increase of the work function of ITO.

AB - During a surface treatment using CF 4 /O 2 gas plasma, energetic ions affected the defect structures on the top surface of ITO thin films. C-AFM and local I-V measurements showed the formation of the depleted layer after a plasma treatment with a bias of 20 W; XPS showed the creation of new defect structures. Donor concentration in the damaged top surface of the ITO films was found to be decreased. Sn-based neutral defect complexes and reduced oxygen, which could trap the electrons, have been proposed to be formed. This can also explain the increase of the work function of ITO.

KW - Conducting atomic force microscopy

KW - Ion damage

KW - ITO

UR - https://www.scopus.com/pages/publications/34547844413

U2 - 10.1016/j.apsusc.2007.05.029

DO - 10.1016/j.apsusc.2007.05.029

M3 - Article

AN - SCOPUS:34547844413

SN - 0169-4332

VL - 253

SP - 8928

EP - 8932

JO - Applied Surface Science

JF - Applied Surface Science

IS - 22

ER -

Effects of ion damage on the surface of ITO films during plasma treatment

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Keywords

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