Abstract
The surface of ITO in OLEDs was treated with HfOx deposition process using an atomic layer chemical vapor deposition system. The treatment at room temperature for 5 cycles exhibited significantly improved electroluminescent characteristics compared to the OLEDs without any treatment, which is believed to be caused by the increased holes injection efficiency.
| Original language | English |
|---|---|
| Pages (from-to) | 970-972 |
| Number of pages | 3 |
| Journal | Proceedings of International Meeting on Information Display |
| Volume | 2006 |
| State | Published - 2006 |
| Event | IMID/IDMC 2006: 6th Internaional Meeting on Information Display and the 5th International Display Manufacturing Conference - Daegu, Korea, Republic of Duration: 22 Aug 2006 → 25 Aug 2006 |
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