Effects of bias voltage on the properties of ITO films prepared on polymer substrates

Jaehyeong Lee; Hakkee Jung; Donggun Lim; Keajoon Yang; Woochang Song; Junsin Yi

doi:10.1016/j.tsf.2004.11.144

Effects of bias voltage on the properties of ITO films prepared on polymer substrates

Jaehyeong Lee
, Hakkee Jung
, Donggun Lim
, Keajoon Yang
, Woochang Song
, Junsin Yi

Department of Electronic and Electrical Engineering

Kunsan National University
Korea National University of Transportation
Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

31 Scopus citations

Abstract

The ITO (indium tin oxide) thin films were deposited on acryl, glass, PET, and poly-carbonate substrates by DC reactive magnetron sputtering. The bias voltage was changed from -20 to -80 V. As the bias voltage increased, the deposition rate of ITO films decreased regardless of substrate types. The roughness of the films on PET increased with the bias voltage. The study demonstrated that the bias improved the electrical and optical properties of ITO films regardless of substrate types. The lowest electrical resistivity of 5.5×10^-4 Ω-cm and visible transmittance of about 80% were achieved by applying a negative bias of -60 V.

Original language	English
Pages (from-to)	157-161
Number of pages	5
Journal	Thin Solid Films
Volume	480-481
DOIs	https://doi.org/10.1016/j.tsf.2004.11.144
State	Published - 1 Jun 2005

Keywords

Bias
Indium tin oxide (ITO)
Magnetron sputtering
Organic substrate

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10.1016/j.tsf.2004.11.144

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@article{59518b0baa2e47cc848e6439c3c2b9f5,

title = "Effects of bias voltage on the properties of ITO films prepared on polymer substrates",

abstract = "The ITO (indium tin oxide) thin films were deposited on acryl, glass, PET, and poly-carbonate substrates by DC reactive magnetron sputtering. The bias voltage was changed from -20 to -80 V. As the bias voltage increased, the deposition rate of ITO films decreased regardless of substrate types. The roughness of the films on PET increased with the bias voltage. The study demonstrated that the bias improved the electrical and optical properties of ITO films regardless of substrate types. The lowest electrical resistivity of 5.5×10-4 Ω-cm and visible transmittance of about 80\% were achieved by applying a negative bias of -60 V.",

keywords = "Bias, Indium tin oxide (ITO), Magnetron sputtering, Organic substrate",

author = "Jaehyeong Lee and Hakkee Jung and Donggun Lim and Keajoon Yang and Woochang Song and Junsin Yi",

year = "2005",

month = jun,

day = "1",

doi = "10.1016/j.tsf.2004.11.144",

language = "English",

volume = "480-481",

pages = "157--161",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Effects of bias voltage on the properties of ITO films prepared on polymer substrates

AU - Lee, Jaehyeong

AU - Jung, Hakkee

AU - Lim, Donggun

AU - Yang, Keajoon

AU - Song, Woochang

AU - Yi, Junsin

PY - 2005/6/1

Y1 - 2005/6/1

N2 - The ITO (indium tin oxide) thin films were deposited on acryl, glass, PET, and poly-carbonate substrates by DC reactive magnetron sputtering. The bias voltage was changed from -20 to -80 V. As the bias voltage increased, the deposition rate of ITO films decreased regardless of substrate types. The roughness of the films on PET increased with the bias voltage. The study demonstrated that the bias improved the electrical and optical properties of ITO films regardless of substrate types. The lowest electrical resistivity of 5.5×10-4 Ω-cm and visible transmittance of about 80% were achieved by applying a negative bias of -60 V.

AB - The ITO (indium tin oxide) thin films were deposited on acryl, glass, PET, and poly-carbonate substrates by DC reactive magnetron sputtering. The bias voltage was changed from -20 to -80 V. As the bias voltage increased, the deposition rate of ITO films decreased regardless of substrate types. The roughness of the films on PET increased with the bias voltage. The study demonstrated that the bias improved the electrical and optical properties of ITO films regardless of substrate types. The lowest electrical resistivity of 5.5×10-4 Ω-cm and visible transmittance of about 80% were achieved by applying a negative bias of -60 V.

KW - Bias

KW - Indium tin oxide (ITO)

KW - Magnetron sputtering

KW - Organic substrate

UR - https://www.scopus.com/pages/publications/18444370288

U2 - 10.1016/j.tsf.2004.11.144

DO - 10.1016/j.tsf.2004.11.144

M3 - Article

AN - SCOPUS:18444370288

SN - 0040-6090

VL - 480-481

SP - 157

EP - 161

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Effects of bias voltage on the properties of ITO films prepared on polymer substrates

Abstract

Keywords

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